What wavelength range does the deep-UV configuration cover?

The deep-UV SmartEngine configuration covers 155–410 nm. The final configuration is reviewed against the measurement environment, the optical interface and the purge arrangement.

Why does nitrogen purging matter?

Deep-UV wavelengths are strongly affected by air absorption, contamination and the behavior of the optical path. Purging with nitrogen displaces the absorbing air and keeps the short-wavelength path clean and usable.

Is this only for semiconductor applications?

No. Semiconductor process monitoring and inspection are the major use cases, but deep-UV spectroscopy also supports materials, plasma, absorption, environmental and research measurements.

Why not use a standard UV spectrometer?

A standard UV bench that performs well above 200 nm is not optimized for sensitivity, purge behavior, optical materials or stray-light control below it. The deep-UV configuration is recommended only when the measurement requires that region.

Configuration · 155–410 nm

Deep-UV SmartEngine spectrometers

Deep-UV measurements require more than a shorter wavelength range. The nitrogen-purged deep-UV SmartEngine configuration covers 155–410 nm for semiconductor process monitoring, plasma optical emission spectroscopy, UV inspection, source monitoring and thin-film metrology, applications in which short-wavelength sensitivity, optical cleanliness and stable acquisition determine the result.

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Nitrogen purging

A purged optical path for deep-UV measurement

Deep-UV emission

Nitrogen-purged path

155–410 nm spectrum

Deep-UV measurement conditions

Measurement conditions below 200 nm

Optical materials, source intensity, detector response, stray light, air absorption, purging, contamination and calibration all have a disproportionate effect once the wavelength drops below about 200 nm. Oxygen in the optical path absorbs the light being measured, and surface contamination that is invisible at 400 nm is opaque at 160 nm. Nitrogen purging maintains a usable deep-UV path by displacing the air and slowing contamination of the optics, so Evolve Sensing treats the purge as part of the instrument rather than as an accessory.

Nitrogen-purged optical path for deep-UV operation
155–410 nm coverage in suitable configurations
Short-wavelength sensitivity and optics optimized for the deep UV
Low stray-light design, because deep-UV signals are weak while visible signals are strong
Synchronization and integration options for process tools
Compact configuration options for OEM and embedded instruments

Applications

Applications for the deep-UV configuration

Semiconductor process monitoring and plasma etch endpoint (optical emission spectroscopy), lithography-adjacent and laser-driven source monitoring, UV inspection, thin-film optical metrology on deep-UV-sensitive stacks, process gas measurement, materials research and short-wavelength absorption workflows. Semiconductor process monitoring is the largest of these applications.

Selection guidance

Standard UV-Vis benches above 200 nm

Many UV spectrometers perform well above 200 nm but are not optimized for sensitivity, purge behavior, optical materials or stray-light control at shorter wavelengths. The deep-UV SmartEngine is intended for measurements that require the 155–200 nm region. The right choice depends on source, optics, purge requirements, detector sensitivity and calibration, and for measurements above 200 nm Evolve Sensing recommends the standard SmartEngine.

Applications

Related applications

Semiconductor Thin film & ellipsometry

Product lines

Frequently asked questions

What wavelength range does the deep-UV configuration cover?: The deep-UV SmartEngine configuration covers 155–410 nm. The final configuration is reviewed against the measurement environment, the optical interface and the purge arrangement.
Why does nitrogen purging matter?: Deep-UV wavelengths are strongly affected by air absorption, contamination and the behavior of the optical path. Purging with nitrogen displaces the absorbing air and keeps the short-wavelength path clean and usable.
Is this only for semiconductor applications?: No. Semiconductor process monitoring and inspection are the major use cases, but deep-UV spectroscopy also supports materials, plasma, absorption, environmental and research measurements.
Why not use a standard UV spectrometer?: A standard UV bench that performs well above 200 nm is not optimized for sensitivity, purge behavior, optical materials or stray-light control below it. The deep-UV configuration is recommended only when the measurement requires that region.

Related architectures

Ethernet-ready spectrometers

Gigabit Ethernet with onboard memory, ring-buffer and batch acquisition, near-zero trigger latency and hardware reset for OEM and industrial systems.

Dual and wide-range architectures

Two optical benches on one trigger: UV-Vis plus NIR systems covering 180–1700 nm, and staged coverage toward 2500 nm.

Single-input dual-detector NIR

One optical input and two InGaAs channels covering 900–2500 nm, so both bands measure the same sample spot.

Next step

Review a deep-UV measurement with an engineer

Send the wavelength range, the source, the optical input and the purge arrangement you have or need. An engineer will confirm whether the deep-UV configuration is required or whether a standard bench meets the requirement.